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2007, 02, No.128 48-50+53
电解抛光技术研究进展
基金项目(Foundation): 国家高技术863计划资助课题。
邮箱(Email):
DOI: 10.19289/j.1004-227x.2007.02.014
摘要:

介绍了电解抛光技术的研究现状﹑特点及抛光原理,分析了工件表面粗糙度的主要影响因素。指出了电解抛光技术存在的问题。

Abstract:

The current status,characteristic and polishing principle of electropolishing technology were introduced. The main factors affecting workpiece’s surface roughness are analyzed. The existing problems in electropolishing technology are presented.

参考文献

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基本信息:

DOI:10.19289/j.1004-227x.2007.02.014

中图分类号:TG175

引用信息:

[1]张素银,杜凯,谌加军等.电解抛光技术研究进展[J].电镀与涂饰,2007,No.128(02):48-50+53.DOI:10.19289/j.1004-227x.2007.02.014.

基金信息:

国家高技术863计划资助课题。

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