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[目的]对紫铜进行等离子电解抛光处理，以解决传统抛光工艺存在的效率低、环境污染等问题，实现高效、绿色的表面精加工。[方法]通过正交试验研究加工电压、抛光时间、电解液温度及试样下潜深度对紫铜抛光后表面粗糙度的影响，对比了抛光前后紫铜的外观、表面形貌、显微硬度和耐蚀性。[结果]紫铜等离子电解抛光的较优工艺参数为：电压260 V，电解液温度60℃，抛光时间11 min，下潜深度8 cm。在该条件下抛光后，紫铜的表面光洁度与均匀性明显改善，显微硬度略降，表面粗糙度Ra可由0.834μm降至0.052μm，疏水性增强，耐蚀性显著提升。[结论]等离子电解质抛光可高效、环保地实现紫铜表面精整，在航空航天、集成电路等领域具有广阔的应用前景。
Abstract：[Objective] Plasma electrolytic polishing was applied to red copper to address the issues of low efficiency and environmental pollution associated with conventional polishing processes, thereby achieving an efficient and green surface finishing. [Method] The effects of processing voltage, polishing time, electrolyte temperature, and immersion depth on the surface roughness of red copper after polishing were studied through orthogonal experiments. The appearance, surface morphology, microhardness, and corrosion resistance of red copper before and after plasma electrolytic polishing were compared. [Result] The optimized process parameters for plasma electrolytic polishing of red copper were determined as follows: voltage 260 V, electrolyte temperature 60 °C, polishing time 11 min, and immersion depth 8 cm. Under these conditions, the surface finish and uniformity of red copper were significantly improved, while the microhardness was slightly decreased. The surface roughness Ra was reduced from 0.834 μm to 0.052 μm, accompanied by enhanced hydrophobicity and significantly improved corrosion resistance. [Conclusion] Plasma electrolytic polishing can achieve efficient and environmentally friendly surface finishing of red copper, demonstrating broad application prospects in fields such as aerospace and integrated circuits.
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基本信息:
DOI：10.19289/j.1004-227x.2026.02.014
中图分类号:TG175
引用信息:
[1]葛玉麟,邹永纯,程佳浩,等.紫铜等离子电解抛光工艺研究[J].电镀与涂饰,2026,45(02):120-125.DOI:10.19289/j.1004-227x.2026.02.014.
基金信息:
国家自然科学基金(52571078,52001100); 北京市自然科学基金(2244110)